Heating and Cooling Chiller

Heating and Cooling Chiller

The heating and cooling chiller adopts a fully closed cycle. It will not generate oil mist at high temperature and will not absorb water at low temperature. There is an expansion tank in the system. During the cooling and heating process, the heat transfer medium expands with heat and contracts with cold. It has a thermodynamic temperature control system. A series of functions meet high requirements, technology guarantees high precision of temperature control and good repeatability of results, short heating and cooling time, wide temperature range, simple navigation menu, important parameters at a glance, and real-time temperature changes are displayed in the form of graphs, ensuring Stable circulation and flow prevent damage to glass reactors caused by soft starts.

The main function of heating and cooling chiller is used for heating and cooling of glass reactors, metal reactors, and bioreactors. It is especially suitable for linear control of the temperature of materials in the reactor when there is a need for heat and exothermic process control during the reaction process. You can choose In the program control mode, the temperature difference between the heat transfer medium and the material can also be set.

There are two main control principles of heating and cooling chiller:

1. The method of changing the control setting value can respond to the system lag in the process as soon as possible and obtain a smaller system overshoot. The control consists of two sets of PID control loops, which are called the main loop and the slave loop, and the control output of the master loop is used as the set value of the slave loop. The system adopts feed-forward PV, the output of the PID operation result of the main control loop is compounded with the feed-forward PV signal as the set value of the slave control loop, and through this gradient control of temperature changes, the temperature control accuracy of the system is guaranteed.

2. The hysteresis estimator generates a dynamic signal instead of the process variable as the feedback signal. Generate a signal to the controller, so that the controller does not have a large delay in predicting the control effect, so that the controller can always generate an appropriate control signal. That is, this dynamic signal keeps the feedback loop working properly even in the presence of large hysteresis. However, if the general PID is used to control the process with significant time lag, the controller output will keep increasing during the lag time due to the lack of proper feedback signal, which will lead to a large overshoot of the system response and even make the system out of control.

Des solutions personnalisées pour votre entreprise

Systèmes de refroidissement et de chauffage (série SUNDI)

Plage de contrôle de la température : -120°C à +350°C

Application: Various Reactors (Microchannels, Glass, Jacketed Reactors, etc.), Distillation or Extraction System, Laboratory, University, Research Institute, Aerospace, Automotive Industry, Semiconductor and Electrical Test, Chemical, Pharmaceutical, Petrochemical, Biochemical, Medical, Hospital, R&D Workshop, Aerospace, Biological and Other Industries.

Systèmes de refroidissement et de chauffage (série WTD)

（Micro canal / réacteurs tubulaires spécialisés）

Plage de contrôle de la température : -70°C à +300°C

Conception spécialisée pour les microcanaux (faible capacité de rétention des liquides, forte capacité d'échange thermique, système de circulation à forte perte de charge).

Cooling and Heating Systems (TES series)

Temperature Control Range: -85°C ~ +250°C

Temp Control Accuracy: ± 0.3°C

Cooling and Heating Machines (LTS series)

Temperature Control Range: -80°C to +80°C

It is widely used in the semiconductor process to control the temperature of the reaction chamber, the hot sink plate and the non-flammable heat transfer medium.

Circulateurs de chauffage et de refroidissement

Plage de contrôle de la température : -45°C à +250°C

Application: Various Reactors (Microchannels, Glass, Jacketed Reactors, etc.), Distillation or Extraction System, Laboratory, University, Research Institute, Aerospace, Chemical, Pharmaceutical, Petrochemical, Biochemical, Medical, Hospital, R&D Workshop, Aerospace, Biological and Other Industries.

Circulateurs de chauffage

Plage de contrôle de la température : +50°C à +300°C

Note : La série UC peut contrôler la température du fluide caloporteur. La série UST peut non seulement contrôler la température du fluide caloporteur, mais aussi la température du matériau de réaction.

TCU Système de contrôle de la température des multiréacteurs

Plage de contrôle de la température : -120°C à +250°C

Application: Various Reactors (Microchannels, Glass, Jacketed Reactors, etc.), Distillation or Extraction System, Laboratory, University, Research Institute, Aerospace, Chemical, Pharmaceutical, Petrochemical, Biochemical, Medical, Hospital, R&D Workshop, Aerospace, Biological and Other Industries.